Enter the Age of Cobalt Wires
As the semiconductor manufacturing process was developed below 10 nanometers the shortcomings of the “copper”, the conductor metal, began to show. The process technology reached the bottleneck between 10 nanometers (10 nanometers) and 7 nanometers (7 nanometers). Therefore, major equipment and semiconductor producers began investing in new materials research to solve the problems of semiconductor manufacturing technology. Applied Materials has a reputation for being a leader in the field of semiconductor equipment. It’s the pioneer semiconductor manufacturer to employ “cobalt” instead of “copper”, “tungsten” or traditional conductor materials. It is poised to implement such an industrial revolution in commercial chips. This has historic significance. With advanced technology between 10 and 7, “cobalt,” as a conductor, can be achieved stronger conductivity and lower power consumption. The future may see it drop to as low as 5 or 3 nanometer process points. Unlike transistors, wires and contacts coated with metal are less efficient when smaller than they are. When the wire is compared with a straw it will be more susceptible to blocking. There are three main criteria for selecting the right wire material: filling ability, resistance, and reliability. Aluminium is less reliable for processes exceeding 30 nanometers. However, copper is highly-qualified and is still an important metal. Unfortunately, even though the process is below 20 nanometers in high-end, their performance has not been ideal. However, cobalt is the new king of new wire materials. It is known for its filling power, reliability and resistance.Cobalt would be widely used in the Semiconductor Field
The advantages cobalt has as a small-scale semiconductor make it possible for the industry to expect that cobalt metallic materials from the 7/10 nanometer range will enter the manufacturing of semiconductor wires. Expect “cobalt” materials to expand beyond the 5-nanometer process. Intel is believed to have revealed that the IEEE will include 10 parts interconnection layers on nanometer technology technology nodes. Details of imported cobalt metal, which can be found in the 10 nm bottom node interconnection of 2 layer imported cobalt, can increase electron mobility and decrease the access to the double resistance. It’s a large number of semiconductor manufacturing companies. Rmcplant (aka. Rmcplant is an advanced material. With over 12 years’ experience, Rmcplant is an established global supplier of chemical material. High purity, small particles size, and low impurity are the hallmarks of our nano cobalt powder. We can help you if the price is lower.Inquiry us