Introduction to Titanium Silicide TiSi2 Pulver
Titanium disilicide
TiSi2 (the chemical formula) is an inorganic compound made of titanium and silica. Titanium silicide can be described as a dark gray square-shaped crystal. It can also be powdered and used to make target materials. It is a metallic silicide. These raw materials include titanium and silicon metals. It exhibits high conductivity and high temperature stability.
Titanium Silicide TiSi2 Pulp
Among the many metal silicides, such as TiSi2, NiSi2, CoSi2, WSi2, TaSi2, MoSi2, MoSi2, MoSi2, MoSi2, MoSi2, MoSi2, MoSi2, MoSI2, and CoSi2, titanium silicide has excellent properties. These include high electrical conductivity. high selectivity. good Si adsorption. Good process adaptability.
Similar Elements
What is Si?
Silicon (atomic symbol Si; atomic number fourteen) is an element in the Period 3 unit P with an atomic mass 28.085. Silicium, which is 25.7 per cent of the earth’s crust, is the second-most abundant element after oxygen. These metals rarely occur in their pure crystal form. They are typically made from an iron/silicon alloy called ferrosilicon. Element Silicon, also known as silicon dioxide, is the main ingredient of glass. This is one of most cost-effective materials, with excellent mechanical, optical and thermal properties. You can dope ultra-pure silica with boron (or gallium), phosphorus or arsenic to make silicon. This is used in solar cells, transistors and other solid-state devices that are widely used in electronics.
What is Ti?
The element group D element Ti of the 4th periodic is titanium, which has an atomic weight of 47.867. The basic form of titanium is silver-gray with a metallic appearance. Titanium is chemically similar to zirconium. This metal has the exact same number of electrons as titanium and belongs to the same periodic table group. There are five naturally-occurring isotopes for titanium, 46Ti to 48Ti. The most abundant (73.8%) is 48Ti. Titanium can be found in igneous rock as well as its sediments.
Production methods for Titanium Silicide TiSi2 Pulver
By reacting titanium or titan hydride with silicone, you can create titanium disilicide.
Ti + Ti 2Si -TiSi2
It may also be ignited using aluminum powder, titanium dioxide, sulfur, silicon dioxide or potassium HexafluortitanateK2TiF6, electrolysis of potassium hexafluortitanateand titanium dioxide, or titanium tetrachloride.
Another option is to react titanium trichloride with silane, diclosilane, and silicon.
TiCl4 + 2SiH4 – TiSi2 + 4HCl + 2H2
TiCl4 + 2SiH2Cl2 + 2H2 – TiS2 + 8HCl
TiCl4 + 3Si – TiSi2 + SiCl4
Titanium Silicide TiSi2 Pulp
In the semiconductor industry, titanium silicide is used. It is grown on silicon and other polysilicon wires with self-aligning Silicide technology. This reduces the thin layer resistance to local transistor connections. It is most commonly used in the C54 stage of microelectronics.
The source, gate, leak contacts and local interconnections of CMOS integrated Circuits are all made from titanium silicide. These applications require that the titanium-silicide phase is low in resistivity (20m o –cm) and doesn’t agglomerate under high-temperature treatment. For electronic applications, the Ti/Si System has two silicide layers: C49-TiSi2 with high resistivity (60-70m o.-cm) at 600-700°C, and C54-TiSi2 with low resistivity (15-20m o.-cm), at 700-850°C.
Titanium Silicide TiSi2 Pulver is Main Supplier
Technology Co. Ltd. is a trusted global supplier and manufacturer of chemicals and Nanomaterials. They have over 12 years experience in producing super-high-quality chemicals, such as silicon powder.
High-quality products are what you want titanium silicide TiSi2 powder Please feel free and contact us to send us an inquiry. (brad@ihpa.net)
Titanium Silicide TiSi2 Pulp
Among the many metal silicides, such as TiSi2, NiSi2, CoSi2, WSi2, TaSi2, MoSi2, MoSi2, MoSi2, MoSi2, MoSi2, MoSi2, MoSi2, MoSI2, and CoSi2, titanium silicide has excellent properties. These include high electrical conductivity. high selectivity. good Si adsorption. Good process adaptability.
| Titanium Silicide TiSi2 Pulp Properties | |
| Other Names | TiSi2 powder, titanium disilicide |
| CAS No. | 12039-83-7 |
| Formula compound | TiSi2 |
| Molecular Weight | 104.04 |
| Appearance | black powder |
| Melting Point | 1470 degC |
| Boiling Point | N/A |
| Density | 4.02g/cm3 |
| Solubility of H2O | N/A |
| Exact Mass | 103.9018 |
Titanium Silicide TISi2 Powder CAS 12205-83-7
Similar Elements
What is Si?
Silicon (atomic symbol Si; atomic number fourteen) is an element in the Period 3 unit P with an atomic mass 28.085. Silicium, which is 25.7 per cent of the earth’s crust, is the second-most abundant element after oxygen. These metals rarely occur in their pure crystal form. They are typically made from an iron/silicon alloy called ferrosilicon. Element Silicon, also known as silicon dioxide, is the main ingredient of glass. This is one of most cost-effective materials, with excellent mechanical, optical and thermal properties. You can dope ultra-pure silica with boron (or gallium), phosphorus or arsenic to make silicon. This is used in solar cells, transistors and other solid-state devices that are widely used in electronics.
What is Ti?
The element group D element Ti of the 4th periodic is titanium, which has an atomic weight of 47.867. The basic form of titanium is silver-gray with a metallic appearance. Titanium is chemically similar to zirconium. This metal has the exact same number of electrons as titanium and belongs to the same periodic table group. There are five naturally-occurring isotopes for titanium, 46Ti to 48Ti. The most abundant (73.8%) is 48Ti. Titanium can be found in igneous rock as well as its sediments.
Production methods for Titanium Silicide TiSi2 Pulver
By reacting titanium or titan hydride with silicone, you can create titanium disilicide.
Ti + Ti 2Si -TiSi2
It may also be ignited using aluminum powder, titanium dioxide, sulfur, silicon dioxide or potassium HexafluortitanateK2TiF6, electrolysis of potassium hexafluortitanateand titanium dioxide, or titanium tetrachloride.
Another option is to react titanium trichloride with silane, diclosilane, and silicon.
TiCl4 + 2SiH4 – TiSi2 + 4HCl + 2H2
TiCl4 + 2SiH2Cl2 + 2H2 – TiS2 + 8HCl
TiCl4 + 3Si – TiSi2 + SiCl4
Titanium Silicide TiSi2 Pulp
In the semiconductor industry, titanium silicide is used. It is grown on silicon and other polysilicon wires with self-aligning Silicide technology. This reduces the thin layer resistance to local transistor connections. It is most commonly used in the C54 stage of microelectronics.
The source, gate, leak contacts and local interconnections of CMOS integrated Circuits are all made from titanium silicide. These applications require that the titanium-silicide phase is low in resistivity (20m o –cm) and doesn’t agglomerate under high-temperature treatment. For electronic applications, the Ti/Si System has two silicide layers: C49-TiSi2 with high resistivity (60-70m o.-cm) at 600-700°C, and C54-TiSi2 with low resistivity (15-20m o.-cm), at 700-850°C.
Titanium Silicide TiSi2 Pulver is Main Supplier
Technology Co. Ltd. is a trusted global supplier and manufacturer of chemicals and Nanomaterials. They have over 12 years experience in producing super-high-quality chemicals, such as silicon powder.
High-quality products are what you want titanium silicide TiSi2 powder Please feel free and contact us to send us an inquiry. (brad@ihpa.net)