Next-Generation Semiconductor Wires: Cobalt
The invention of chip/integrated circuit/semiconductor is the premise for human to enter the information society. As the largest manufacturing sector in the modern era, the chip industry — the semiconductor industry — is at the forefront of technological innovation and represents human industrial manufacturing capabilities. The third industrial revolution, based on semiconductor, has been continually detonated, both by policy and market, with the assistance of artificial intelligence (and big data). China’s semiconductor sector has provided the greatest development opportunities since the establishment of the People’s Republic of China. The pace of innovation for new materials is expected to increase as Moore’s Law approaches its end. Today, twenty years after IBM introduced “copper”, the “era” of “cobalt in the semiconductor industry will officially begin.
Recent years have seen many key moments in the semiconductor industry, most notably in device technology as well as transistor architecture. There is a new turning point coming in the semiconductor industry. Innovation of new materials is being followed by “cobalt”, which will slowly end “tungsten” or “copper”.
Enter the Age of Cobalt Wires
As the semiconductor manufacturing process was developed below 10 nanometers the shortcomings of the “copper”, the conductor metal, began to show. The process technology reached the bottleneck between 10 nanometers (10 nanometers) and 7 nanometers (7 nanometers). Therefore, major equipment and semiconductor producers began investing in new materials research to solve the problems of semiconductor manufacturing technology.
Applied Materials has a reputation for being a leader in the field of semiconductor equipment. It’s the pioneer semiconductor manufacturer to employ “cobalt” instead of “copper”, “tungsten” or traditional conductor materials. It is poised to implement such an industrial revolution in commercial chips. This has historic significance.
With advanced technology between 10 and 7, “cobalt,” as a conductor, can be achieved stronger conductivity and lower power consumption. The future may see it drop to as low as 5 or 3 nanometer process points.
Unlike transistors, wires and contacts coated with metal are less efficient when smaller than they are. When the wire is compared with a straw it will be more susceptible to blocking. There are three main criteria for selecting the right wire material: filling ability, resistance, and reliability.
Aluminium is less reliable for processes exceeding 30 nanometers. However, copper is highly-qualified and is still an important metal. Unfortunately, even though the process is below 20 nanometers in high-end, their performance has not been ideal. However, cobalt is the new king of new wire materials. It is known for its filling power, reliability and resistance.
Cobalt would be widely used in the Semiconductor Field
The advantages cobalt has as a small-scale semiconductor make it possible for the industry to expect that cobalt metallic materials from the 7/10 nanometer range will enter the manufacturing of semiconductor wires. Expect “cobalt” materials to expand beyond the 5-nanometer process.
Intel is believed to have revealed that the IEEE will include 10 parts interconnection layers on nanometer technology technology nodes. Details of imported cobalt metal, which can be found in the 10 nm bottom node interconnection of 2 layer imported cobalt, can increase electron mobility and decrease the access to the double resistance. It’s a large number of semiconductor manufacturing companies.
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High-pressure water mist
Cobalt Powder has a wide range of uses due to its outstanding physical, chemical, and mechanical characteristics. This spray technique has been used extensively. The technological process is to activate the induction furnace. Once the cobalt melts into the furnace it will leak into the packaging. From there, the annular fluid of high-pressure water and the liquid of cobalt will separate into millions of small beads and droplets through condensation. Finally, after drying and dehydration, you will obtain nanometer Cobalt Powder.
Electrolytic procedure
Electrolysis can prepare cobalt metal powder. The basic principle is that you use a cobalt plate and a high-polished stainless steel water jacket to act as anode. The electrolyte is usually cobalt chloride, or cobalt sodium sulfate in an aqueous solution. An electrolytic cell receives direct current. The electrolyte then becomes ionized. The cobalt ions form Cobalt powder at this point. A sufficient amount of active surface agent is added to the electrolyte in order to avoid the accumulation of Cobalt Powder.
Cobalt hydrogen oxide reduction
Cobalt Hydrogen Oxide Reduction is another popular method for the preparation cobalt powder for cemented caride. This process is mainly based upon cobalt oxide (Co2O3, Co2O3 & CoO as raw materials) and Cobalt Powder for cemented carbide is also prepared using this method.
Rmcplant (aka. Rmcplant is an advanced material. With over 12 years’ experience, Rmcplant is an established global supplier of chemical material. High quality Cobalt Powder are produced by our company. We can help you if the price is lower.
Inquiry us